发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain the titled composition capable of enduring to conditions of an electroless copper plating by incorporating a high polymer compd. contg. a cinnamoyl group, a photosensitizer, a coloring agent, a solvent and a thermoplastic resin or an epoxy resin to the titled composition. CONSTITUTION:The titled composition comprises the high polymer compd. contg. the cinnamoyl group, the photosensitizer, the coloring agent, the solvent and the thermoplastic resin or the epoxy resin as an improver of the chemical resistance. The high polymer compd. contg. the cinnamoyl group comprises a polycinnamic acid vinyl ester etc. The thermoplastic resin comprises a polysulfone, a polyether sulfone, a phenoxy resin etc. The compounding ratio of the titled composition is 10-30wt% the polycinnamic acid vinylester, 10-30wt% the thermoplastic resin or the epoxy resin, 0.03-1.5wt% the photosensitizer, 0.1-0.5wt% the coloring agent and a residual amount of a solvent such as xylene and a cellosolve acetate etc.
申请公布号 JPS61177448(A) 申请公布日期 1986.08.09
申请号 JP19850018650 申请日期 1985.02.04
申请人 MITSUBISHI ELECTRIC CORP 发明人 MASUI KATSUE;MORIWAKI NORIMOTO;ANDO TORAHIKO
分类号 C08G59/00;C08G59/32;G03F7/004;G03F7/027;G03F7/038;H05K3/00;H05K3/18 主分类号 C08G59/00
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