| 摘要 |
PURPOSE:To eliminate easily an inert reaction product by subjecting this inert reaction product, which is generated chemically on a 'Sendust(R)' film, to oxygen plasma treatment to make this product water-soluble when an insulating layer on the sendust film of a back core part in a thin film magnetic head is subjected to reactive etching in gas plasma. CONSTITUTION:When a back core part B between a lower core part 1a and an upper core part 1b of the thin film magnetic head is formed, an insulating film 6 consisting of an SiO2 or the like is first provided on a sendust film 5 to be the lower core. After a photoresist pattern 7 is formed on the film 6, gaseous CF4 is used as a reaction gas to eliminate the SiO2 film 6 by the reactive etching method. At this time, an inert material 8 remains chemically on the 'Sendust(R)' film 5. The material 8 is allowed to stand in oxygen plasma and is degenerated to a water-soluble material 9, and this material is washed away with water to expose the sendust film 5. Next, the upper core 1b is joined to complete magnetic coupling of the back core B. Thus, the excellent thin film magnetic head is obtained.
|
