发明名称 PRODUCTION OF POROUS THIN FILM
摘要 PURPOSE:To improve yield strength to laser and surface mechanical strength by depositing simultaneously >=2 kinds of materials by evaporation on a substrate to form a mixed film and treating the mixed film with water or aq. soln. CONSTITUTION:The mixed film is formed on the substrate 2 by simultaneous vapor deposition of >=2 kinds of materials for vapor deposition having different refractive indices and the materials for vapor deposition are partly removed by treating the mixed film with the water or aq. soln., by which the porous thin film is manufactured. methods such as vacuum deposition, sputtering and chemical vapor deposition are usable for the vapor deposition to manufacture the mixed film. Various materials such as Al2O3, CeO2 and Si are possible as the materials for the vapor deposition. Mainly glass as well as other semiconductors, plastics and metals are usable for the substrate for vapor deposition. Pure water, ultra-pure water, etc. are used for removing the water soluble materials. The porous thin film having the high yield strength to laser and highly mechanically strong surface is this obtd. The antireflection effect which is excellent in a wide frequency range is obtd.
申请公布号 JPS61170702(A) 申请公布日期 1986.08.01
申请号 JP19850011070 申请日期 1985.01.25
申请人 YOSHIDA KUNIO;YAMANAKA CHIYOE;SHOWA KOKI SEIZO KK 发明人 YOSHIDA KUNIO;YAMANAKA CHIYOE
分类号 G02B1/11;G02B1/10 主分类号 G02B1/11
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