| 摘要 |
PURPOSE:To make it possible to form easily the fine pattern by applying the glass film capable of rotation application to the film on which the pattern generation is performed by the focused ion beam. CONSTITUTION:In the forming method of the fine pattern applying the focused ion beam, the pattern is directly inscribed on the thin glass film 7 capable of rotation application by the focused ion beam 2. The pattern inscribed on the glass film 7 is developed by the gas plasma. Finally, the film 4 to be manufactured is applied with etching through the mask which is the pattern formed on the thin glass film 7 capable of rotation application, and the desired pattern is formed on the film 4. The pattern generation on the thin glass film capable of rotation application makes the formation of the fine pattern easy. |
