| 摘要 |
PURPOSE:To prevent air bubbles from adhering on the surface of an object to be washed and to improve th washing efeiciency, by washing the object with running water under a reduced pressure. CONSTITUTION:A cover 11a is removed and a casette 17 holding silicon wafers 18, 18... is received in a washing tank 16. A draining on-off valve 15 and an air supply on-off valve 24 are closed while an air exhaust on-off valve 22 is opened, and a vacuum apparatus is driven to evacuate a washing chamber 11. The degree of vacuum is regulated to an arbitrary pressure from several tens to several hundreds torrs by means of s vacuum regulating throttle valve 26. A water supply tube 21 is then caused to start supply of water to wash the silicon wafers 18, 18.... Since the silicon wafers are washed under a reduced pressure, any air bubbles adhering on the surface of the silicon wafers can be removed rapidly. |
