| 摘要 |
PURPOSE:To enhance the efficiency of utilization of a tripolar sputtering target by making the distance between the filament and target larger than the distance between an anode and the target so as to improve uniformity in the damage of the target. CONSTITUTION:A tripolar sputtering source 16 is composed essentially of the target 17, a filament 6 for generating thermoelectrons, the anode 7 biased positively against the filament 6, and a gas introducing part (not shown) close to the anode 7. The filament 6 and the anode 7 are placed on both sides of the target 17, and the distance between the filament 6 and the target 17 is made larger than the distance between the anode 7 and the target 17. By this arrangement the density of thermoelectrons generated from the filament 6 is made uniform on the target 17, so uniformity in the damage of the target 17 is improved, and the reproducibility in the characteristics of a formed film is also enhanced.
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