发明名称 |
Substrate holder for molecular beam epitaxy apparatus |
摘要 |
For use in placing a semiconductor substrate in molecular beam epitaxy apparatus, a holder comprises a heat conductor member opposite to a substrate. The substrate is received in a space formed in a supporting member and is in engagement with a flange portion radially inwardly projected from a peripheral surface of the space. The heat conductor member is heated by a heater in the molecular beam epitaxy apparatus. This results in effective conduction of heat to the substrate. The substrate is easily put in the beam epitaxy apparatus and removed therefrom. The heat conductor member may be of pyrolytic graphite or sintered graphite.
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申请公布号 |
US4599069(A) |
申请公布日期 |
1986.07.08 |
申请号 |
US19850706009 |
申请日期 |
1985.02.27 |
申请人 |
ANELVA CORPORATION |
发明人 |
MURAKAMI, SHUNICHI;ISHIDA, TETSUO;SAKAI, JUNRO |
分类号 |
C30B23/08;C23C14/50;C30B23/06;H01L21/203;(IPC1-7):F27D5/00;C23C14/00;F24H3/00;H01J37/305 |
主分类号 |
C30B23/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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