PHOTOPOLYMERIZABLE COMPOSITION

摘要

PURPOSE:To obtain a composition for forming a permanent protective mask having superior electric insulation, mechanical strength and resistance to alkalis, org. solvents and heat by using a linear copolymer obtd. under prescribed conditions, a polymerizable monomer and a photopolymn. initiator as constituents. CONSTITUTION:The 1st component is a linear copolymer obtd. by copolymerizing 2-50mol% glycidyl (meth)acrylate with 50-98mol% other nonacidic vinyl monomer such as methyl (meth)acrylate and carrying out partial (meth)acrylation. The linear copolymer contains 1-10mol% (meth)acrylated glycidhyl (meth)acrylate units and 1-40mol% un(meth)acrylated glycidhyl (meth) acrylate units. The 2nd component is a polymerizable monomer having two or more terminal ethylene groups such as multifunctional ester of (meth)acrylic acid. The 3rd component is a photopolymn. initiator such as benzoin. A composition obtd. by using those components has superior performance as a resist for electroless plating of a printed wiring board.