| 摘要 |
PURPOSE:To obtain a photosensitive compsn. good in high-speed developability and high in printing resistance for use in a lithographic plate by incorporating an org. acid oligomer having a weight average mol.wt. of <=1,000 in a photosensitive compsn. contg. a diazo compd. and a hydrophilic org. polymer carrier. CONSTITUTION:The photosensitive compsn. contg. a diazo compd. and a hydrophilic org. polymer carrier contains an org. acid oligomer having a weight average mol.wt. of <=1,000. As the photosensitive diazo compd., an aromatic diazonium salt and an active carbonyl compd., especially, a diazo resin typified by a formaldehyde condensate, are enumerated, and above all, diazo resin soluble in org. solvents is preferable. The diazo resin is used in an amt. of 1-30wt%, preferably, 3-15wt% of the photosensitive compsn. |
