发明名称 ION MILLING APPARATUS WITH ELECTRON BEAM END POINT DETECTION MECHANISM
摘要 PURPOSE:To enable the checking to ensure that a sample (containing transparent sample) is milled upto the required thickness, by irradiating electron beams emitted from an electron gun to detect the thickness thereof after milling. CONSTITUTION:A sample 2 is supported almost at the center of a vacuum chamber 1 and two ion guns 3 are set sandwitching the sample 2 to mill it from the surface and back thereof 2. An electron gun 4 and an anode 5 are provided above the sample 2 while Faraday gauge 6 is provided therebelow to detect the electron dose passing through the sample 2. Then, argon gas introduced into the ion gun 3 ionized and accelerated with an anode 7 to impinge on the surface of the sample 2 until the sample 2 is made into a thin film being gradually scrapped off by the ion beam. So, an electron beam from the electron gun 4 is transmitted through the sample 2 and the transmission electron dose is detected with the Faraday gauge 6. thus, the thickness of the sample 2 can be determined by previously examining the electron beam transmittance of main material.
申请公布号 JPS61130848(A) 申请公布日期 1986.06.18
申请号 JP19840251866 申请日期 1984.11.30
申请人 HITACHI NAKA SEIKI KK 发明人 NONAKA HIROTAKA;KATAGIRI SHINJIRO
分类号 H01J37/28;G01N1/32;H01J37/30;H01J37/32 主分类号 H01J37/28
代理机构 代理人
主权项
地址