发明名称 |
Cathode sputtering apparatus with adjacently arranged stations |
摘要 |
Cathode sputtering apparatus with at least two adjacently arranged stations including a charging station and a coating station. At least one sputtering cathode and a substrate carrier that can execute reciprocatory movement between the stations are arranged on a vacuum chamber. The substrate carrier is secured by means of an extension arm eccentrically on a pivot bearing passing through the vacuum chamber. A coolant circulation line is led through the pivot bearing to the substrate holder.
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申请公布号 |
US4595483(A) |
申请公布日期 |
1986.06.17 |
申请号 |
US19850716854 |
申请日期 |
1985.03.28 |
申请人 |
LEYBOLD HEARAEUS GMBH & CO KG |
发明人 |
MAHLER, PETER |
分类号 |
C23C14/34;C23C14/56;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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