发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain superior color developing performance and repeatability by using specified spironaphthoxazine and transparent resin. CONSTITUTION:A photosensitive resin composition is composed of 0.1-50wt% spironaphthoxazine deriv. represented by the formula (where each of R1 and R2 is H, lower alkyl, lower alkoxy, halogen, nitro or cyano) and 95.5-50wt% transparent resin. The resin composition has a high return speed such as less than several ten sec in the dark at room temp. as well as suprior color developing performance and high repeatability, and the spironaphthoxazine deriv. is not decomposed when irradiated with ultraviolet rays. The resin composition is used as a material for spectacle lenses, a sunshine shielding film, paint, resin for printing clothes or an ornament.
申请公布号 JPS61123835(A) 申请公布日期 1986.06.11
申请号 JP19840246883 申请日期 1984.11.20
申请人 UNITIKA LTD 发明人 HOSODA MASAHIRO
分类号 G03C1/00;C09K9/00;C09K9/02;G03C1/685;G03F7/004 主分类号 G03C1/00
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