| 摘要 |
PURPOSE:To improve an area yield of a growth film by providing a substrate support equipment with a thermal reflecting plate covering a front peripheral portion and a side portion of this substrate support plate in an outer peripheral portion of the substrate support plate. CONSTITUTION:A thermal reflecting place 11 is composed of, for instance, Ta plates of about 0.1mm in thickness, and is shaped to coat a front peripheral portion and a side portion in an outer peripheral portion of a substrate support plate 4. In a surface facing a front surface of the substrate support plate 4 and in a surface facing a side surface, plural projections 12 of about 1 mm height of cheuron-shape are provided, and the substrate support plate 4 is constructed as to be embedded from its front side keeping-a surface of a peripheral portion of the substrate support plate 4 is returned to the substrate support plate 4 by the reflection of the thermal reflecting plate 11, heat diffusion of the heat radiation is controlled and the temperature lowering of the peripheral portion is decreased. |
