发明名称 EXPOSURE MASK
摘要 PURPOSE:To enable good protection of a mask without dropping from a mask holder even when the failure and the like of the vacuum exhaust system generate, by a method wherein supporting members are provided with an engagement means at a position distant from the supporting position of a thin film in a required amount in the level direction. CONSTITUTION:An original pattern 134 is fixed on one surface side of the formed thin film 136, and this film 136 is provided with supporting members 132 and 130 which support the periphery except the part where the pattern 134 is formed. Besides, the supporting members 132 and 130 are provided with the engagement means 108 engaging the thin film 136 to an exposure device in suspension via supporting members 132 and 130, at a position distance from the position of supporting the film 136 in a required amount in the level direction to the thin film surface. For example, said supporting members 132 and 130 should contain a circular frame 132 supporting the thin film 136 and a cylindrical member 130 having one end fixed to the frame 132, and said engagement means 108 should contain a flange 108 formed by projection outward of the outer end of the cylindrical member 130.
申请公布号 JPS615518(A) 申请公布日期 1986.01.11
申请号 JP19840125041 申请日期 1984.06.20
申请人 NIHON KOUGAKU KOGYO KK 发明人 HAYASHI YUTAKA
分类号 G03F1/00;G03F1/22;G03F1/88;H01L21/027;H01L21/30 主分类号 G03F1/00
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