发明名称 Electroplating composition and process and surfactant compound for use therein
摘要 Non-ionic surfactants prepared by reaction of ethoxylated bisphenols and sulfating agents such as sulfamic acid, sulfuric acid and chlorosulfonic acid are employed in metal electroplating baths and processes to increase the useful operating temperature limits of the baths in comparison to those using other non-ionic surfactants. The surfactants are particularly useful as additives in acid zinc electroplating baths, and especially acid zinc electroplating baths either completely devoid of ammonium ion or containing low amounts of ammonium ion.
申请公布号 US4592809(A) 申请公布日期 1986.06.03
申请号 US19850762940 申请日期 1985.08.06
申请人 MACDERMID, INCORPORATED 发明人 FONG, JAAN J.;BECKING, DONALD H.
分类号 B01F17/42;C07C67/00;C07C301/00;C07C303/06;C07C303/08;C07C303/24;C07C303/32;C07C305/06;C07C305/10;C07C309/09;C07C309/28;C07C309/41;C07C309/42;C08G65/48;C25D3/22;C25D3/56;(IPC1-7):C07C143/38 主分类号 B01F17/42
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