| 摘要 |
PURPOSE:To improve remarkably the treating capacity of a wafer by providing a carrier on a carrying-in chamber and a carrying-out chamber. CONSTITUTION:An end station is constituted with the first carrying-in chamber 20 and the second carrying-in chamber 30 of a low vacuum, the first direction control chamber 70, a common treating chamber 60 of a high vacuum, the second direction control chamber 80, and the first carrying-out chamber 40 and the second carrying-out chamber 50 of a low vacuum. The carrying-in chamber 20 is provided with a carrying belt 22, gate valves 23, 24, and a carrier 25 which is made to ascend and descend stepwise by a lifting mechanism, and a carrying belt 21 is provided on the inlet part. In this state, plural carriers 25 which are carried in by one sheet each from the air by the carrying belt 21 are installed to the carrier 25, and after a rough drawing, one sheet each is fetched from said carrier and carried to the direction control chamber 70. Carriers 35, 45 and 55 are also operated in the same way. |
