| 摘要 |
<p>PURPOSE:To increase a film forming speed, and to manufacture a uniform and homogeneous aSi photosensitive body by providing inside and outside cylindrical electrodes of a concentric circle shape in a reaction tank, providing a photosensitive base body of a cylindrical electric conductor between both the electrodes, and also leading in a raw material gas from plural parts. CONSTITUTION:A cylindrical outside electrode 21 is formed on the inside peripheral surface of an outside peripheral wall 11 of a reaction tank 10 of a plasma CVD device, and a cylindrical inside electrode 22 is provided on the concentric circle of said electrode. Plural photosensitive base bodies 30 consisting of a cylindrical electric conductor are provided at equal intervals between both the electrodes 21, 22, and they are rotated and revolved on the periphery by a rotating and revolving mechanism 60. Also, plural leading-in ports 40 of a raw material gas to the inside of the reaction tank 10 are provided at equal intervals on the outside peripheral wall 11, and an exhaust port 50 is provided on the center shaft through the inside electrode 22. According to this mechanism, before many gases pass through the periphery of plural base bodies and are exhausted, the utilization efficiency of the raw material gas is improved.</p> |
