发明名称 MASK REPAIRING DEVICE
摘要 PURPOSE:To limit the blowing of compd. vapor to a prescribed region and to decrease the rate of blowing by constituting a nozzle for supplying the compd. vapor to the prescribed position in such a manner that the nozzle can be moved back and forth. CONSTITUTION:A stopper 15 is attached near to one end of the nozzle 12 which supplies the compd. vapor to the defect position of a sample 6 and an air cylin der 16 is connected to the end. The cylinder 16 is driven, by which the top end of the nozzle 12 is moved back and forth. The stopper 15 stops by contacting with a support 17 in the stage of advancing the same and the dis tance between the top end of the nozzle 12 and the sample 16 is set at an opti mum value. On the other hand, the communication between a compd. housing hole 13 and the nozzle 12 is interrupted when the nozzle 12 is advanced. Driving of a sample base 19 is made possible at the same instant and the opening and closing of the gate valve between a sample chamber and a preliminary sample chamber are made possible by actuating a microswitch 18 by the stopper 15.
申请公布号 JPS61110140(A) 申请公布日期 1986.05.28
申请号 JP19840232853 申请日期 1984.11.05
申请人 SEIKO INSTR & ELECTRONICS LTD 发明人 SATO MITSUYOSHI;MINAFUJI TAKASHI;NAKAGAWA YOSHITOMO
分类号 G03F1/00;G03F1/72;G03F1/74;H01L21/027 主分类号 G03F1/00
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