发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device and the method of manufacturing the same are disclosed, the semiconductor device having a plurality of elements isolated by a groove having a gentle slope at the upper side wall, and a steep slope at the lower side wall. This groove provides low steps on its mouth and occupies a small area on the substrate, thus enabling an extremely high-density integrated circuit to be formed.
申请公布号 DE3174468(D1) 申请公布日期 1986.05.28
申请号 DE19813174468 申请日期 1981.09.16
申请人 HITACHI, LTD. 发明人 TAMAKI, YOICHI;KURE, TOKUO;SATO, AKIRA;HIGUCHI, HISAYUKI
分类号 H01L21/762;(IPC1-7):H01L21/76;H01L27/04 主分类号 H01L21/762
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