发明名称 (VSIS) semiconductor laser with reduced compressive stress
摘要 A V-channeled substrate inner stripe (VSIS) laser is manufactured on a GaAs substrate. The VSIS laser includes p-Ga0.7Al0.3As active layer, and an n-Ga0.85Al0.15As cap layer. The GaAs substrate is removed from the final device. The n-Ga0.85Al0.15As cap layer functions to support the final device, and to minimize a stress applied to the p-Ga0.7Al0.3As active layer.
申请公布号 US4592062(A) 申请公布日期 1986.05.27
申请号 US19830498041 申请日期 1983.05.25
申请人 SHARP KABUSHIKI KAISHA 发明人 YAMAMOTO, SABURO;HAYASHI, HIROSHI;YANO, SEIKI
分类号 H01L21/208;H01S5/00;H01S5/24;(IPC1-7):H01S3/19 主分类号 H01L21/208
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