发明名称 |
(VSIS) semiconductor laser with reduced compressive stress |
摘要 |
A V-channeled substrate inner stripe (VSIS) laser is manufactured on a GaAs substrate. The VSIS laser includes p-Ga0.7Al0.3As active layer, and an n-Ga0.85Al0.15As cap layer. The GaAs substrate is removed from the final device. The n-Ga0.85Al0.15As cap layer functions to support the final device, and to minimize a stress applied to the p-Ga0.7Al0.3As active layer.
|
申请公布号 |
US4592062(A) |
申请公布日期 |
1986.05.27 |
申请号 |
US19830498041 |
申请日期 |
1983.05.25 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
YAMAMOTO, SABURO;HAYASHI, HIROSHI;YANO, SEIKI |
分类号 |
H01L21/208;H01S5/00;H01S5/24;(IPC1-7):H01S3/19 |
主分类号 |
H01L21/208 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|