| 摘要 |
PURPOSE:To provide irregularities on the surface with good controllability, by applying, exposing and developing a photoresist, in which light-shielding fine grains are mixed, and using a substrate etching agent. CONSTITUTION:A photoresist 1 of positive type and ultra minute grains 2 of carbonblack are mixed and applied on a glass plate 3 to a thickness of about 1mum. The mixture is exposed and developed. Then the resist 1 remains only at a part where light is shielded by the carbonblack grains 2. When the surface of the glass is etched by HF, the surface, where many circular glass cylinders are dispersed, is obtained. The size of the circular cylinder is determined by the size of the carbonblack ultra minute grain. The height of the circular cylinder is determined by the etching time. The degree of the irregularities on the coarse surface can be controlled precisely. The resist type and the minute grains are selected, and the implementation of the coarse surfaces of various base bodies can be accomplished. |
