| 摘要 |
PURPOSE:To make it feasible to form thin films very rapidly by a method wherein a light source of ultraviolet rays to activate the surface of substrate and an oscillator of laser beams to excite reaction gas are provided. CONSTITUTION:The surface of substrate 5 heated by a heater 3 at low temperature is irradiated with ultraviolet rays from a light source 22 to activate the substrate 5. Besides, reaction gas 4 is flowed from an inlet 7 to a substrate 5 to be irradiated with laser beams 12 for photochemical reaction. Resultantly, thin films with even thickness may be formed very rapidly on the substrate 5. |
