| 摘要 |
PURPOSE:To obtain good image quality freed of interference fringes even in the case of using long-wavelength rays by laminating a blocking layer contg. microcrystallized Si, and a photoconductive layer contg. microcrystallized Si, and both made of Si as a base material on a conductive substrate. CONSTITUTION:The blocking layer 2 made of microcrystallized Si (muc-Si), photoconductive layer 3 made of said muc-Si, and a surface layer 4 made of an amorphous material, each layer made of Si as a base material, are laminated on a conductive substrate 1 to form a photosensitive body of laminate structure. The muc-Si for forming both layers 2, 3 is extremely smaller in the optical band gap Eg<opt> than a-Si, so the layer 2 can sufficiently absorb light in the longer wavelength side, such as IR rays, thus permitting both layers 2, 3 to be enhanced in photosensitivity, and applied to the electrophotographic sensitive body without impairing superior merits of Si, reflected light to be restrained to about 10%, and hence, interference fringes not to appear on an image. |
