发明名称 X-RAY EXPOSURE DEVICE
摘要 PURPOSE:To form an X-ray exposure device, which hardly consumes helium gas, by shaping another groove connected to the outside air inside a groove connected to a vacuum source in a mask mounting surface. CONSTITUTION:Double annular grooves 3, 13 surrounding a hole 9 are formed to the surface 2, to which a mask 5 is fitted, in an atmospheric chamber 1, the external groove 3 is connected to a vacuum source 4 in the same manner as conventional devices, and the internal groove 13 is connected outside the atmospheric chamber by a hole 14. Consequently, the pressure of the groove 13 is made approximately the same as the outside air, a gas flowing into the groove 3 from the inside of the groove 3 through a clearance between the mounting surface 2 and the mask 5 is fed mainly from the groove 13, and helium gas in the atmospheric chamber is hardly sucked. Accordingly, the quantity of helium gas injected into the atmospheric chamber can be reduced.
申请公布号 JPS61102734(A) 申请公布日期 1986.05.21
申请号 JP19840223955 申请日期 1984.10.26
申请人 HITACHI LTD 发明人 IKEDA MINORU;KENBO YUKIO;INAGAKI AKIRA;YONEYAMA YOSHIHIRO;FUNATSU RYUICHI
分类号 G03F7/20;H01L21/027;H01L21/30 主分类号 G03F7/20
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