| 摘要 |
PURPOSE:To prevent a formation membrane by such as a discharge from deterioration and to form a film of good quality by providing a gas active method in an introducing portion of a reactive gas in forming a compound thin film through introducing the reactive gas into a vacuum vessel. CONSTITUTION:After a reactive gas is introduced through a gas introducing hole 14 from an external of a vacuum vessel 2 and is dissociated or activated or ionizated by a gas active method 15, it is provided into the vacuum vessel 2 from a gas exhaust nozzle. Because of this, as a thin film forming region and an active method is isolated and the reactive gas is provided to a thin film forming portion in an activated state, a deterioration of forming membrane by a process such as a discharge is prevented and a film of good quality can be formed. |
