| 发明名称 |
Photopolymerizable composition for use as an etching-resist ink. |
| 摘要 |
<p>A photopolymerizable composition, suitable for use as an etching-resist ink in the production of printed circuit boards, comprises poly-N-vinylpyrrolidone (A); a compound (B) represented by the formula (I) …<CHEM>… wherein each of R<1>, R<2> and R<3> represents independently a hydrogen atom or a methyl group; an acid amide (C) represented by the formula (II)… …<CHEM>… wherein R<4> represents a hydrogen atom or a methyl group, a monomeric compound (D) containing an acryloyl group or a methacryloyl group and optionally a photopolymerization-initiator (E).</p> |
| 申请公布号 |
EP0180466(A2) |
申请公布日期 |
1986.05.07 |
| 申请号 |
EP19850307865 |
申请日期 |
1985.10.30 |
| 申请人 |
NIPPON KAYAKU KABUSHIKI KAISHA |
发明人 |
NAWATA, KAZUYOSHI;KATAYAMA, MASAHITO;YOKOSHIMA, MINORU |
| 分类号 |
C08F2/00;C08F2/46;C08F2/48;C08F2/50;C08F20/00;C08F20/26;C08F26/00;C08F26/10;C08F220/28;C08F269/00;C08F271/02;C09D11/10;G03F7/027;H04W24/00;H04W88/08;H05K3/00;H05K3/06;H05K3/12;(IPC1-7):C09D11/10;G03C1/68;H05K3/02 |
主分类号 |
C08F2/00 |
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