| 摘要 |
PURPOSE:To obtain a sensor which has less resistance value and ready positioning by revising to flow a current in a main scanning direction formed in a pattern to flow a current in a sub scanning direction in the conventional one for a bit to be photoelectrically converted. CONSTITUTION:The positions of a crank pattern 8 are at A and D, which are the ends of a photoconductive film 6 formed by mask depositing, and formed in pattern with a smooth slope, but at B and C, which are formed by photoetching, and formed in pattern with clear step. Then, an electrode pattern 9 made of Cr/Au is formed buy positioning the crank pattern 8 by lifting OFF method of entirely depositing photoetching method. The steps (B and C positions) are inclined at sharp angle, and the electrode films are cut, and the pattern remains, but no current flows. On the other hand, since the ends are tapered at the positions A, D, the electrode films are not cut, but electrically connected. |
