发明名称 |
OXIDATION-PROOF OSMIUM FILM |
摘要 |
<p>PURPOSE:To prevent any oxidation and evaporation of osmium by coating an osmium film with a layer of a base metal such as tungsten. CONSTITUTION:A tungsten plate is coated with an osmium film with about 0.5mum thickness. Osmium is a high-melting-point metal and therefore the above osmium film is formed by electron-ray vapordeposition. After the thus formed body is thermally treated in a nonoxidative atmosphere at about 1,100 deg.C for about 2hr, osmium does not evaporate from the film even when it is oxidized in the atmosphere.</p> |
申请公布号 |
JPS6188420(A) |
申请公布日期 |
1986.05.06 |
申请号 |
JP19850103893 |
申请日期 |
1985.05.17 |
申请人 |
HITACHI LTD |
发明人 |
HONDA YUKIO;AIDA TOSHIYUKI;TAGUCHI TADANORI;FUKUSHIMA HIROSHI;YAMAMOTO YOSHIHIKO |
分类号 |
H01J1/14;H01J1/28;H01J9/04 |
主分类号 |
H01J1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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