发明名称 OXIDATION-PROOF OSMIUM FILM
摘要 <p>PURPOSE:To prevent any oxidation and evaporation of osmium by coating an osmium film with a layer of a base metal such as tungsten. CONSTITUTION:A tungsten plate is coated with an osmium film with about 0.5mum thickness. Osmium is a high-melting-point metal and therefore the above osmium film is formed by electron-ray vapordeposition. After the thus formed body is thermally treated in a nonoxidative atmosphere at about 1,100 deg.C for about 2hr, osmium does not evaporate from the film even when it is oxidized in the atmosphere.</p>
申请公布号 JPS6188420(A) 申请公布日期 1986.05.06
申请号 JP19850103893 申请日期 1985.05.17
申请人 HITACHI LTD 发明人 HONDA YUKIO;AIDA TOSHIYUKI;TAGUCHI TADANORI;FUKUSHIMA HIROSHI;YAMAMOTO YOSHIHIKO
分类号 H01J1/14;H01J1/28;H01J9/04 主分类号 H01J1/14
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