| 摘要 |
PURPOSE:To improve the accuracy of pattern and to obtain a reticle on which a pellicle film enabled to increase the quality of an IC is formed by forming a light-transmittable protection film having a curved surface on its one side other the side opposed to a substrate provided with a light transmission part and a light shielding part having required pattern on the substrate. CONSTITUTION:A semicylindrical pellicle film 15 is formed by circularly heaping up a pair of upper surfaces of a square frame 16 in any one direction out of its X and Y directions. Even if light is reflected between the pellicle film and the reticle, the reflected light is scattered to other parts except the pattern and multiple reflection is not generated between them. Therefore, the transfer pattern is prevented from influences due to the pellicle film and the pattern part is protected from dust or hurt by the pelliclefilm similarly to the ordinally method. Consequently, the required accuracy of the pattern can be obtained. |
