| 摘要 |
PURPOSE:To execute the non-destructive and average measurement of film thickness by measuring capacity between the 2nd and 3rd reference patterns. CONSTITUTION:The 1st reference pattern 3 is formed in the 1st conductive layer and the 2nd reference pattern 7 opposed to the 1st pattern 3 with a prescribed area is formed in the 2nd conductive layer through an insulating layer 4. The 3rd reference pattern 8 electrically connected to the 1st reference pattern 3 is formed in the 2nd conductive layer and the film thickness of the insulating layer can be found out by measuring the capacity between the 2nd and 3rd reference patterns 7, 8. Consequently, the average film thickness of inter-layer insulating layer can be found out non-destructively. |
