| 摘要 |
PURPOSE:To manufacture a stable multilayered film by alternately laminating thin layers of a metallic oxide which is easily reduced with gas and thin layers of silicon oxide and by subjecting the resulting multilayered film to reduction treatment with gas to form a reduced product of the metallic oxide between the silicon oxide layers. CONSTITUTION:Thin layers of a metallic oxide which is easily reduced with gas such as FeO3, CoO or NiO and thin layers of silicon oxide such as SiO or SiO2 are alternately laminated on a substrate by vacuum deposition or other method. The resulting multilayered film is subjected to reduction treatment with hydrogen at about 200 deg.C for about 1hr to form a reduced product of the metallic oxide such as Fe3O4, Co or Ni in the form of hyperfine particles. Thus, a stable multilayered film contg. said reduced product between the silicon oxide layers is obtd. |
