发明名称 LINEAR ENERGY BEAM IRRADIATING DEVICE
摘要 PURPOSE:To make uniform the density of irradiation energy as well as to improve the reproducibility of an irradiation process by a method wherein a radiation rays rotating means, with which the rays projected on the material to be processed located on a rotating stand are equivalently rotated with the rotating angle of the rotating stand, is provided. CONSTITUTION:A clutch is coupled to the tips 38, 39, 48 and 49 of the X-Y movable screws of X-Y stages 33 and 34, and four wafers (11-14) are shifted in such a manner that their center parts are positioned at the point directly below the four windows of a beam mask 21 through the intermediary of a motor. A turn table 2 is rotated at a constant speed through the intermediary of a rotation controlling circuit 9, and a linear electron beam 5 is emitted from an electron beam source 6. At this time, the beam source 6 is rotatingly moved by a motor 71 at the same speed as the turn table 2 in such a manner that the longitudinal direction of the linear beam is in parallel with the straight line which links the center of the wafer 1 and the center of the turn table 2. Said rotatable movement of the beam source is repeatedly performed on each sample.
申请公布号 JPS6167912(A) 申请公布日期 1986.04.08
申请号 JP19840190268 申请日期 1984.09.11
申请人 SONY CORP 发明人 USUI SETSUO
分类号 H01L21/20 主分类号 H01L21/20
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