| 摘要 |
<p>PURPOSE:To reduce deformation during contacting, improve contactness and perform fine patterning by fitting a support member which deforms easily to the peripheral part of a glass mask body used for contact printing as a photomask for semiconductor manufacture. CONSTITUTION:When a semiconductor device such as a transistor (TR), LC, LSI, VLSI, etc., is manufactured, the area surrounded with a glass mask 1, mask support base 2, wafer chuck 4, etc., is evacuated and the glass mask 1 is drawn toward the wafer 3 to bring the mask 1 and wafer 3 into contact with each other. The glass mask body 11 is formed to size smaller than the opening part of a mask holding base 2, and its peripheral part is surrounded with the support member 12 which deforms easily. The support member 12 is made of rubber, rubber of polyurethane, etc., or resin. The support member 12 deforms elastically and the glass mask body 11 contacts the wafer 3 without deforming.</p> |
