发明名称 Polishing pad for a fine finish
摘要 A medium for polishing surfaces comprised of very fine silica particles bonded into a resinous foam. The medium is compounded by bubbling ammonia through a mix of polyol and ethyl silicate to generate bonded silica particles of very small size, then adding a di-isocyanate compound to develop the foam.
申请公布号 US4579564(A) 申请公布日期 1986.04.01
申请号 US19850692506 申请日期 1985.01.18
申请人 SMITH, ROBERT S. 发明人 SMITH, ROBERT S.
分类号 B24D3/32;C08G18/38;(IPC1-7):B24D17/00 主分类号 B24D3/32
代理机构 代理人
主权项
地址