发明名称 SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE:To utilize a metal source of high purity once treated till the last by holding the surface of a metal source at a certain height, the metal source in a metal source container decreasing in accordance with the number of its growth. CONSTITUTION:A metal source 1 is loaded on a quartz piston 3 moving up and down in a quartz boat 2. A quartz spring 4 is disposed between the quartz piston 3 and the bottom of the quartz boat 2. When the source 1 is decreased by repeating the number of times of its growth, the weight of the source 1 is decreased. The piston 3 is raised by the decrement of the weight owing to restoring force of the spring 4 to hold the surface of the source 1 at a certain height, which allows the source 1 of high purity once treated to be utilized to the last.
申请公布号 JPS6159721(A) 申请公布日期 1986.03.27
申请号 JP19840183004 申请日期 1984.08.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 NISHIMURA TAKASHI
分类号 H01L21/20;C23C16/448;C23C16/52;H01L21/205 主分类号 H01L21/20
代理机构 代理人
主权项
地址