| 摘要 |
PURPOSE:To eliminate the film defects occurring in ions by providing a transparent conductive film between a substrate and a dielectric film or between the dielectric films thereby transmitting and diffusing the ions which glow nuclei by gathering at each boundary face into the transparent conductive film. CONSTITUTION:The substrate 1 forms a plane plate or lens by glass, quartz, plastic, etc. and titanium dioxide, zirconium dioxide, silicon dioxide, etc. are used for the dielectric films 2. The scum remaining after preliminary cleaning sticks on the substrate 1 and therefore the transparent conductive 3 is deposited by evaporation on the substrate prior to the vapor deposition of the films 2 and the films 2 are deposited by evaporation thereon. The film 3 consists of indium oxide, tin dioxide or a material mixture composed thereof and is deposited by high-frequency ion plating, etc. The ions possessing contamination and the ions of the particles evaporating from the dielectric material trying to gather at the nuclei thereof are thereby transmitted on the film surface and are diffused. The growth of the nuclei between the substrate 1 and the films 2 is thus prevented by providing the film 3. |
