发明名称 |
TRAEGER ZUR VERWENDUNG BEI DER AUFBRINGUNG EINER SCHICHT AUF EINE SILICIUM-HALBLEITERSCHEIBE |
摘要 |
A susceptor for use in an in-line or continuous deposition of a film on a silicon wafer by a CVD process, which comprises Si-SiC ceramic containing 7% to 25% by weight of metallic silicon having a high purity. The susceptor has enhanced mechanical strength and dimensional stability and can normally be used repeatedly a large number of times. Further, by using such a susceptor a uniform film can be deposited on the silicon wafer by the CVD process, and a silicon wafer can be coated with a film having desired electrical properties by the CVD process without contaminating the silicon wafer. |
申请公布号 |
DE3531789(A1) |
申请公布日期 |
1986.03.20 |
申请号 |
DE19853531789 |
申请日期 |
1985.09.06 |
申请人 |
TOSHIBA CERAMICS CO.,LTD. |
发明人 |
TAMAMIZU,TERUYASU;SATO,KICHIHEI;TANAKA,TAKASHI;SATO,SYUNKICHI |
分类号 |
H01L21/205;C23C16/458;C30B25/12;H01L21/31;(IPC1-7):C23C16/44 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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