发明名称 |
PHOTORESIST MATERIAL |
摘要 |
<p>The photoresist material comprises a polymer having chloromethyl groups introduced therein and containing 2-isopropenyl-naphthalene as one component, an average substitution degree of the chloromethyl groups based on the polymer is within a range of 0.2 to 5. The photoresist material has a high glass transition point, a high sensitivity to radiation and an excellent dry etching resistance, whereby it is suitably used for the manufacture of a semiconductor element using radiation and provides a good resolution on etching.</p> |
申请公布号 |
CA1202148(A) |
申请公布日期 |
1986.03.18 |
申请号 |
CA19830429204 |
申请日期 |
1983.05.30 |
申请人 |
KUREHA KAGAKU KOGYO KABUSHIKI KAISHA |
发明人 |
DOI, HIDEAKI;KOKUBUN, KENICHI;SAKAGAMI, TERUO;MURAYAMA, NAOHIRO |
分类号 |
C08F2/46;G03F7/038;(IPC1-7):C08F12/06;C08F2/00;C08F132/00;C08F210/00;C08F232/00;C08G59/00;C08F112/06;C08F212/06;C08G65/14;C08F12/34;C08F112/34;C08F212/34;C08G59/34;C08F32/00;C08F10/00;C08F110/00 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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