| 摘要 |
PURPOSE:To feed back a result of monitor to the shutter system and carry out highly acurate water patterning by monitoring change in amount of light of lamp for lighting on the stage. CONSTITUTION:A light amount monitor sensor 10 is provided on the stage 9 where a water 8 of semiconductor device is placed on the stage 9, change in amount of light of lamp 1 for lighting is monitored with the sensor 10 and a result of detection of sensor 10 is input to an integrator 4. A measured value of light monitor 2 of the lamp house system is input to the other input of integrator 4 and the shutter 3 is controlled with an output of integrator 4. Difference in amount of light before and after a reticle 6 is loaded to a device is detected with the sensor 10 and result of detection is fed back to the shutter system through the integrator 4. This feedback control the shutter 4 with adequate exposing time and realizes high precision water patterning. |
