| 摘要 |
PURPOSE:To obtain the titled etching improver ensuring an increased rate of etching and improved accuracy by adding a specified amount of an anionic surfactant represented by a specified formula to an aqueous soln. of ferric chloride or cupric chloride used as an etchant. CONSTITUTION:At least one kind of anionic surfactant represented by a general formula RO-(CH2CH2O-)nSO3X (where R is 6-15C alkyl, X is H, an alkali metal, ammonium or alkylamine, and n is an integer of 0-10) is added to an aqueous soln. of ferric chloride or cupric chloride by 0.05-8.0% to manufacture an etching improver. At least one kind of said anionic surfactant mixed with at least one kind of nonionic surfactant selected among ether type, amino-ether type and fatty acid alkanolamide type nonionic surfactants in (100:0)-(50:50) weight ratio may be added to the aqueous soln. by 0.05-8.0%. |
