METHOD AND APPARATUS FOR CONTROLLING MAGNETRON SPUTTERING APPARATUS HAVING SEPARATION LIMIT MAGNETIC FIELD FOR SEPARATING TARGET EXPOSED TO SEPARATION DISCHARGE,申请号JP19850102817-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR CONTROLLING MAGNETRON SPUTTERING APPARATUS HAVING SEPARATION LIMIT MAGNETIC FIELD FOR SEPARATING TARGET EXPOSED TO SEPARATION DISCHARGE
摘要
申请公布号	JPS6141767(A)	申请公布日期	1986.02.28
申请号	JP19850102817	申请日期	1985.05.16
申请人	VARIAN ASSOC INC	发明人	DONARUDO EMU MINTSU
分类号	C23C14/36;C23C14/34;C23C14/35;C23C14/54;H01J37/34;H01L21/203;H01L21/285;H01L21/31	主分类号	C23C14/36
代理机构		代理人
主权项
地址

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