| 摘要 |
The process according to the invention consists in depositing one of the following crystalline phases or a mixture of these phases: a phase having a tetragonal structure B50C2 and a phase having a rhombohedral structure B13C2, such that the C/B atomic ratio in the deposited material is between 0.04 and 0.22. This atomic ratio is adjusted to a value within this range, with this value being greater the greater the desired hardness of the coating, with this hardness having a value in the range between 3.200 and 5.100 kg/mm2 (HK0.1 microhardness). According to a preferred embodiment, the coating is formed by chemically depositing in vapour phase, with a gaseous mixture containing at least one boron compound, in particular boron trichloride, and at least one carbon compounds, in particular methane, being reduced in the presence of hydrogen.
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