| 摘要 |
PURPOSE:To obtain a pattern superior in heat resistance and prevented from sag or the like due to heat produced by ion etching or the like by incorporating a specified hydroxybenzylamine compd. in a photosensitive compsn. an aromatic hydroxyl compd. or its deriv. as a structural unit. CONSTITUTION:The photosensitive compsn. superior in heat resistance to the conventional ones and prevented from sag, etc., of a resist pattern due to heat produced by ion etching of a substrate is obtained by incorporating in a compsn. consisting of an aromatic hydroxyl compd., such as a novolak resin obtained by condensation of a phenolic compd. with formalin, a polymer, such as a copolymer of p-vinylphenol and styrene, and a photosensitive agent, such as o-naphthoquinonediazide-sulfonate, a compd. represented by formula I, each of R1-R5 being independently H, halogen, alkyl, aryl, or lower alkyl, at least one of R1, R3, and R5 being (R6)2NCH2-, R6 being 1-5C alkyl. |
