发明名称 PLASMA TREATMENT DEVICE
摘要 PURPOSE:To upgrade the production efficiency of plasma by a method wherein reaction gas is made to blow off in a direction, which is parallel to the progressing direction of the micro wave in the waveguide, in a beam form. CONSTITUTION:Reaction gas is made to blow off in a waveguide 1 from a gas channel 2 and a beam 5 is formed. The reaction gas to blow off in a beam form is mainly brought into a plasmic state at the position of the loop of the electric field of micro wave in the waveguide 1, spreads in the interior of the waveguide 1 sectioned by a partition 3, the neutral gas including active species passes through an opening 6 and is guided into a plasma treating chamber 4. By this way, there is no need to match the position of the loop of the micro wave, the operation is simplified, and moreover, the rematching of the position can be dispensed with to a change of the impedance due to a modification of gas species and so forth.
申请公布号 JPS6134942(A) 申请公布日期 1986.02.19
申请号 JP19840144844 申请日期 1984.07.12
申请人 FUJITSU LTD 发明人 FUJIMURA SHUZO;YANO HIROSHI
分类号 H01L21/205;H01J37/32;H01L21/302;H01L21/3065;H01L21/31 主分类号 H01L21/205
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