| 摘要 |
PURPOSE:To facilitate the evaluation of accuracy of a drawn pattern by a method wherein an accuracy measuring pattern is continuously formed astriding the boundary of the adjoining small region with the pattern width and pitch approximate to the limit of resolution of a pattern forming device. CONSTITUTION:An electron beam 3 is scanned at a uniform speed in X-direction in a raster type electron beam patterning device, the ON-OFF operation of an electron beam is conducted based on the pattern data, and a patterning is performed in one scanning. An accuracy measuring pattern 10 is formed in beltlike form on the region between frames 5 and 6. Said pattern is obtained by repeatedly forming a line of 9.5mum wide, which is approximate to the limit of resolution, at the pitch of 1mum. However, if the deflection width of the electron beam 3 is short by 0.2mum per 256mum of the width W, the length of the interline A part of the boundary between the frames 5 and 6 becomes longer by 0.2mum than the length of the other interline B part, thereby generating disorder in the repetition of patterning. This disorder can be detected very easily by making observation using a miroscope of 100 magnification or thereabout. |
