发明名称 INLINE ELECTRON GUN STRUCTURE
摘要 PURPOSE:To prevent the distortion of a scanned surface formed by a central electron beam and both outer electron beams, by providing an upper and a lower rectangular openings each having a width not smaller than the distance between both outer apertures. CONSTITUTION:A cylindrical portion 29 having a height h1 has an upper and a lower rectangular openings 25, each of which has a height h2 and a width W not smaller than the distance between both outer electron beam apertures 23, 24 and is symmetric to each other as to three apertures provided in the bottom 21 of a converging magnetic pole means 20. Most of the magnetic flux in a horizontal deflecting magnetic field extending through the cylindrical portion 29 in the direction of an axis Y-Y perpendicular to a faceplace is caused to pass through the rectangular openings 25, by the converging magnetic pole means 20 having the apertures. This results in preventing the generation of a magnetic flux which would hinder the change in the magnetic flux in the horizontal deflecting magnetic field. A scanned surface formed by a central electron beam and both outer electron beams is thus kept from being distorted due to coma aberration.
申请公布号 JPS6129046(A) 申请公布日期 1986.02.08
申请号 JP19840150617 申请日期 1984.07.20
申请人 NEC CORP 发明人 NAIKI KAZUAKI
分类号 H01J29/48;H01J29/50;H01J29/51 主分类号 H01J29/48
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