发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <p>PURPOSE:To enhance dying resistance, adhesion to a base, etc., by preparing a photosensitive compsn. made of a sensitizer and a polymer having at least one of repeating units represented by three specified general formulae. CONSTITUTION:A photosensitive fluid is prepared by dissolving in a solvent of cellosolve type a known sensitizer, such as anthrone or benzophenone, and a polymer having at least one of repeating units represented by formulae I, II, and III in which each of R<1>, R<3>, and R<4> is H or methyl; R<2> is 1-6C alkyl; R<5> is H or phenyl or the like; R<6> is H, phenyl, or cyano; R<7> is halogen, nitro, or methoxy; and n is 1 or 2. The sensitizer is used in an amt. of 0.1-20wt% of said polymer.</p>
申请公布号 JPS6127536(A) 申请公布日期 1986.02.07
申请号 JP19840148462 申请日期 1984.07.17
申请人 MITSUBISHI CHEM IND LTD 发明人 MIURA KONOE;OCHIAI TAMEICHI;MAKISHIMA HIDEO
分类号 G02B5/20;G03F7/004;G03F7/027;G03F7/028;G03F7/038 主分类号 G02B5/20
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