| 摘要 |
<p>PURPOSE:To improve adaptability to vapor deposition by using a perylene tetracarboxylic acid deriv. of the specific constitutional formula for a red dye, phthalocyanine dye for a green dye and phthalocyanine and quinacridone dyes for a blue dye. CONSTITUTION:The light having resist sensitivity is irradiated over the entire surface of a substrate on which a resist mask 2 is provided and thereafter the red dye layer 3 of the perylene tetracarboxylic acid deriv. expressed by formula I or formula II (R1 denotes hydrogen, alkyl group, aryl group) is provided thereon by a vacuum deposition method. Only the resist mask is then dissolved to form the 1st patterned dye layer 4. The position of the resist mask is deviated according to the pattern and the 2nd patterned dye layer 5 of the phthalocyanine green dye and the 3rd dye layer 6 of the blue dye consisting of the phthalocyanine dye and quinacridone dye are similarly provided, by which a color filter is formed.</p> |
