| 摘要 |
PURPOSE:To decrease the noise of a hologram disk in the stage of coating the treating material on a substrate and coating further a photoresist thereon by setting the start position for coating of the photoresist at the side outer than the inside position of the surface to be coated with the treating agent. CONSTITUTION:A hole 1a is provided to the center of, for example, the substrate 1 and the treating agent (hexamethyl disilazane, etc.) 2 and the photoresist 3 are coated thereon with the center O as a reference. The treating agent 2 is coated by a spin coating method from the radius r1 of the center O toward the outside and after drying, the photoresist 3 is coated on the side outer from the radius r2. The start position B for coating of the photoresist 3 is set to the side outer than the inside position A of the surface coated with the material 2 so as to attain r1<=r2 radius in this stage. Since the photoresist film is formed on the side outer than the film of the treating agent, the photoresist is formed smoothly without ruggedness and the resulted hologram disk is capable of reducing scattering noise. |
