发明名称 CONTACT TYPE EXPOSURE DEVICE
摘要 PURPOSE:To prevent the reduction of the yield due to a defect of contact by providing a pressurizing mechanism, which applies a pressure to a mask from the rear face of a body to be exposed, to resolve the slip due to the surface shape like waviness of the body to be exposed. CONSTITUTION:A disk 6 is placed on a disk chuck 5, and a vacuum pump 7 is operated to suck the disk 6 by vacuum. A mask 1 is aligned to the disk 6 and is placed on a spacer 2. Thereafter, a vacuum pump 3 is operated to evacuate the gap between the mask 1 and the disk 6. Then, the mask 1 is curved to the surface of the disk by the air pressure and is closely brought into contact with the disk 6. Next, a pressure pump 8 is operated to apply a pressure to the disk 6 from the rear face of the disk 6 through a pressure hole 5c. Thus, the mask 1 and the disk 6 are completely brought into contact with each other even in outermost peripheral parts because the disk 6 is curved in the surface direction.
申请公布号 JPH0427931(A) 申请公布日期 1992.01.30
申请号 JP19900135113 申请日期 1990.05.23
申请人 SHARP CORP 发明人 SHIBATA AKIRA
分类号 G03B27/20;G03F7/20;H01L21/027 主分类号 G03B27/20
代理机构 代理人
主权项
地址